Ultrasonic Cleaning Systems

Ultrasonic Cleaning Systems

Ultrasonic Cleaning Systems

Our ultrasonic cleaning systems are ideal for cleaning semiconductor wafers, FPD glass, and other precision components. We offer a comprehensive lineup of ultrasonic products covering a wide frequency range. Utilizing our in-house cleanrooms and laboratories, we propose cleaning methods and processes that achieve peak performance. Furthermore, we provide a global after-sales service network through our overseas locations.

Ultrasonic Cleaner: QUAVA US Shower AD

Features

• Simultaneous ultrasonic and shower cleaning instantly flushes away dislodged contaminants.
• A single transducer can cover a width of up to 3m, enabling the cleaning of massive substrates with just one unit.
• Our unique liquid contact method reduces DI water consumption by up to 40%.
• The proprietary transducer structure transmits ultrasonic energy directly to the workpiece, significantly enhancing cleaning performance.

Ultrasonic Cleaner: QUAVA Spot Shower

Features

• Efficiently cleans targeted areas by directly injecting ultrasonic-infused cleaning fluid from the nozzle.
• The high-frequency lineup from 430 kHz to 5 MHz allows for the selection of the optimal frequency based on particle size.
• Compatible with chemicals and high-temperature cleaning fluids.
• Suitable for single-wafer cleaning of semiconductor wafers/PLP, as well as hard disk cleaning.